Ceramic Target Silicon Nitride Si3n4 Sputtering Target for Magnetron Sputtering

                        Thin film coating materials Si3N4 sputtering target Our factory supply high quality Al2O3, SiO2, Si3N4, SiC, Nb2Ox, TiOx, ITO, AZO sputtering targets, as well as many other compound

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                        Thin film coating materials Si3N4 sputtering target 

Our factory supply high quality Al2O3, SiO2, Si3N4, SiC, Nb2Ox, TiOx, ITO, AZO sputtering targets, as well as many other compound materials. As ceramic sputtering targets are very fragile with very bad thermal conductivity, so usually it will be bonded with copper backing plate by indium or elastomer, to prolong service time.

Sintering technology are used  to produce ceramic sputtering targets, the shape can be round and rectangle.For round target,the diameter can be 1" to 14" , while thickness can be 3mm to 6.35mm, special size can be customized. For rectangle target, monolithic or several tiles construction will be supplied depending on the size.

  
Product: Si3N4 sputtering target
Purity:  99.5%
Size:  customized
Shape:  Planar 
Technology:  Powder Metallurgy
Packing:  Vacumm sealed, wooden case
                                     

COMPANY PROFILE:

Since 2014

Specializing in high purity sputtering targets.

Leader manufacturer of sputtering materials in China.

Qualified the world certificates such as ISO9001:2008 and SGS.

Comprehensive in R&D, manufacturing, and sales on thin film materials.

Export to more than 15 countries in Europe, Southeast Asia, South America and areas, etc.

Ceramic Target Silicon Nitride Si3n4 Sputtering Target for Magnetron Sputtering

OUR PRODUCTS     

*Metal Target : W, Mo, Ta, Nb, Cu, V, Ni, Ti, Fe, Al ,Zr, Co, Au, Ag, Pt, etc.

*Alloy Target : NiFe, NiCr, NiV, CuNi,TiAl, CoCr, CoFe, WTi, CoTaZr,CuInGa, ZnSn, CuZn, etc

*Ceramic Target : TiO2,Al2O3,Ta2O5, ZrO2,SiC,SiO,SiO2, ITO, GZO, AZO, WS2, MoS2,Ga2O3,HfO2,etc

*Evaporation Materials : Crucible, Pellets,Granules,Pieces,etc

*Backing Plate: Cu, Mo, SS,etc

*Bonding Service: Indium, Elastomer     


Ceramic Target Silicon Nitride Si3n4 Sputtering Target for Magnetron Sputtering

OUR ADVANTAGE

1,Many years manufacturing & exporting experience.

2 Strict & complete QC systerm

3,Perfect after sale systerm     

Ceramic Target Silicon Nitride Si3n4 Sputtering Target for Magnetron Sputtering


PRODUCTION PROCESS

Vacuum electron beam furnace, vacuum induction melting furnace, forging machine, rolling mill, oil press,

vacuum annealing furnace, numerical control lathe, numerical control milling machine, machining center, 

grinding machine, wire cutting, numerical control water cutting, XRF, icp-oes, metallographic detector, etc

Ceramic Target Silicon Nitride Si3n4 Sputtering Target for Magnetron Sputtering
 
Our Quality Control System

Ceramic Target Silicon Nitride Si3n4 Sputtering Target for Magnetron Sputtering

Our Certificates

1. We are an ISO9001 certified company.

2. We've been issued SGS Report.

3. We've been  awarded as a High-Tech Enterprise.

4. We've been invested by the National Fund for High-end Equipment. 

Ceramic Target Silicon Nitride Si3n4 Sputtering Target for Magnetron Sputtering

Our Exhibition

We have been attended exhibitions in Korea, Japan, USA, German, etc.

Ceramic Target Silicon Nitride Si3n4 Sputtering Target for Magnetron Sputtering
 
Application

Magnetic data storage/ Solar photovoltaic/ Glass coating 

Semi-conductor/ Flat panel display/ Decoration coating

Ceramic Target Silicon Nitride Si3n4 Sputtering Target for Magnetron Sputtering

Our Products

We can also produce other metal sputtering targets, evaporation materials, crucibles, compound sputtering targets, etc.

We warmly welcome our dear customers from all around the world with OEM&ODM service.

Ceramic Target Silicon Nitride Si3n4 Sputtering Target for Magnetron Sputtering
                                                                       

Our Team

1. We've been providing high-quality products & service for many years. 

2. The factory covers an area of 2,000 square meter.

3. We have over 30 employees, including a group of experts in non-ferrous industry. 

4. We have a professional team foreign trade. 

Ceramic Target Silicon Nitride Si3n4 Sputtering Target for Magnetron Sputtering
                                                
 
Contact Information

 

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Ceramic Target Silicon Nitride Si3n4 Sputtering Target for Magnetron Sputtering

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